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    光注入退火炉

    产品与服务 > 金属化设备系列 > 光注入退火炉

    光注入退火炉

    调节电池片费米能级变化,控制H总量及价态,提高H钝化与缺陷修复效率,达到降低P型电池衰减效应,提高N型电池转换效率的效果。

    设备名称 Equipment Name

    光注入退火炉  Light Injection Annealing Furnace

    设备型号 Equipment Model

    SC-LED05L/RA


    设备用途 Equipment Application

    调节电池片费米能级变化,控制H总量及价态,提高H钝化与缺陷修复效率,达到降低P型电池衰减效应,提高N型电池转换效率的效果。

    By adjusting the Fermi energy level of the cell, controlling the total amount and valence state of H,improving the efficiency of H passivation and defect repair, to reduce the LID effect of P-type cells and improve the conversion efficiency of N-type cells.


    工艺流程  Process Flow

    预热→光注入→冷却

    Pre-heating →Light Injection →Cooling


    技术特点  Features

    1、双轨产线,机架电气完全独立,互不干扰。

    Dual-track production line, the rack and electrical parts completely independent without interfering operations of each other.

    2、大产能:匹配丝印工序产能,CT≤0.80秒,基于硅片尺寸M10(18X±0.5mm*18X±0.5mm)。
    High throughput: match with the throughput of screen printing process, CT≤0.80s,based on silicon wafer size M10 (18X±0.5mm*18X±0.5mm). 


    设备参数  Parameters